Characterization of Helium Ion Implantation Damage in Metallic Multilayers

Tunable magnetoresistance behavior in suspended graphitic multilayers through ion implantation

We report a tunable magnetoresistance (MR) behavior in suspended graphitic multilayers through point-defect engineering by ion implantation. We find that ion implantation drastically changes the MR behavior: the linear positive MR in pure graphitic multilayers transforms into a negative MR after introducing significant shortrange disorders (implanted boron or carbon atoms), consistent with rece...

Spectroscopic Ellipsometry of Ion-Implantation-Induced Damage

Metallic helium in massive planets

T he most abundant planetary constituents in the universe are hydrogen and helium. In our own solar system, it is estimated that 70% of the planetary mass is of this form, with most of it residing in Jupiter and most of it in a metallic state. The likely metallic state of hydrogen at high pressure has long been recognized (1), although the exact nature of this state and its properties continue ...

Diagnostic characterization of ablation plasma ion implantation

Experiments are reported in which two configurations for ablation-plasma-ion-implantation ~APII! are characterized by diagnostics and compared. The first configuration oriented the target parallel to the deposition substrate. This orientation yielded ion-beam-assisted deposition of thin films. A delay (.5 ms) between laser and high voltage was necessary for this geometry to avoid arcing between...

Low-energy ion-assisted control of interfacial structures in metallic multilayers

A molecular dynamics method has been used to simulate the argon ion-assisted deposition of Cu/Co/Cu multilayers and to explore ion beam assistance strategies that can be used during or after the growth of each layer to control interfacial structures. A low-argon ion energy of 5–10 eV was found to minimize a combination of interfacial roughness and interlayer mixing (alloying) during the ion-ass...